Manufacturing method for hologram which can prevent the formation of ghant holograms due to noise light
US5648857A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 16, 1995 |
| Grant date | Jul 15, 1997 |
| Priority date | — |
| Expiry date | Feb 16, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03H2223/20
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A manufacturing method for a hologram which can control the formation of a ghost hologram due to a surface reflected light caused on an interface with the atmosphere is disclosed. In the first manufacturing method for a hologram by a two-beam method or a one-beam method, on an interface between a substrate having a hologram photosensitive layer and the atmosphere is disposed a quarter-wave plate, and an incident light is converted from a circularly polarized light to a P-polarized light (or an S-polarized light) through the quarter-wave plate. On the other hand, in the second manufacturing method for a hologram, a substrate, which has a hologram photosensitive layer, is fittingly held by prisms on both sides thereof. A reference light is a P-polarized light, and an angle of the reference light to a surface reflected light on an interface of the reference light is set to be approximate to a right angle. It is appropriate that a reproduced hologram is manufactured by the one-beam method by using a hologram manufactured by the above method as a master hologram.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.