Field-symmetric beam detector for semiconductors
US5650629A · kind A · utility
4Cited by
9References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 28, 1994 |
| Grant date | Jul 22, 1997 |
| Priority date | — |
| Expiry date | Jun 28, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An alignment mark and pattern is disclosed for use on semiconductor substrates which are to be patterned in an electron lithography machine. The detector includes two interleaved N-well portions mounted on a P-substrate. The interleaved "fingers" of the N-well portions are spaced to provide narrow gaps which are approximately the width of a projected electron beam. When the beam is located within the gap (or gaps) the projection is in alignment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.