Method and apparatus for cleaning substrates in preparation for deposition of thin film coatings
US5651723A · kind A · utility
57Cited by
19References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 13, 1994 |
| Grant date | Jul 29, 1997 |
| Priority date | — |
| Expiry date | Apr 13, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67051
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A method and apparatus for cleaning a substrate in preparation for thin film coating. The invention involves cleaning the substrate in a cleaning chamber under controlled conditions by a blast of carbon dioxide pellets suspended in and transported by a compressed gas medium.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.