Single-wafer heat-treatment apparatus and method of manufacturing reactor vessel used for same
US5651827A · kind A · utility
28Cited by
4References
11Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Jan 11, 1996 |
| Grant date | Jul 29, 1997 |
| Priority date | — |
| Expiry date | Jan 11, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P40/57
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A reactor vessel includes a quartz glass body having sidewalls and a ceiling formed as a single unit without welds. Translucent or opaque portions are formed by bubbles in the glass where heat insulation is desired and transparent portions are formed by absence of bubbles where heat transmission and visibility are desired. The body is formed by adding quartz glass powder to a mold which is rotated about a central axis so that centrifugal force causes a layer of powder to form on the inside of the mold. The layer is then heated until it melts.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.