Non-photosensitive aqueous blockout composition and blockout method for repairing flaws
US5654032A · kind A · utility
9Cited by
12References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 26, 1995 |
| Grant date | Aug 5, 1997 |
| Priority date | — |
| Expiry date | May 26, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/12
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention resides in a photosensitive composition for screen printing. Preferably, the composition of the invention comprises a polymer comprising a vinylpyridine monomer or polymer having a pyridinium salt character and a photoreactable constituent. The resulting stencil, once dried, exposed, cured, and subjected to alkaline treatment obtains enhanced solvent/water resistance but can be reclaimed using an acidic wash. In use, the stencil provides a screen/stencil assembly or blockout utility of high structural integrity through repeated use and screen printing images of high resolution and quality.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.