Stain resists for polyamide substrates
US5654068A · kind A · utility
19Cited by
4References
13Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 26, 1996 |
| Grant date | Aug 5, 1997 |
| Priority date | — |
| Expiry date | Mar 26, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2969
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A stain-resist for polyamide textiles comprises blends of maleic anhydride/alpha-olefin polymers with sulfonated phenol-formaldehyde condensation products. The stain-resist blends are water-soluble at low pH, even in the absence of surfactant, and are strongly substantive and more resistant to yellowing than the condensation products.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.