Stabilization of a patterned planarizing layer for solid state imagers prior to color filter pattern formation
US5654202A · kind A · utility
15Cited by
18References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 24, 1992 |
| Grant date | Aug 5, 1997 |
| Priority date | — |
| Expiry date | Mar 24, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0007
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A solid state image sensor is described which includes a planarizing layer incorporated into a means of color separation. The planarizing layer has been found to provide a smooth, uniform surface for coating and adhesion of a color separator within the active device area. The planarizing layer remains on the completed device and is patterned to permit access to bonding pads. Negative photoresist materials, photoinitiated polymerization imaging systems and positive imaging systems may be selected for use as the planarizing layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.