Ultra thin silicon oxide and metal oxide films and a method for the preparation thereof
US5661092A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 1, 1995 |
| Grant date | Aug 26, 1997 |
| Priority date | — |
| Expiry date | Sep 1, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/939
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Ultra thin organo-ceramic and metal oxide films are prepared under room temperature and atmospheric conditions by exposing .alpha.,.omega.-functional siloxane oligomers and fatty acid metal soaps, respectively, to a combination of ultraviolet light (UV) and ozone (O.sub.3). The process includes the steps of preparing ultra thin .alpha.,.omega.-functional polysiloxane and fatty acid metal soap films using, but not limited to, the Langmuir-Blodgett (LB) technique. The LB technique permits construction of molecular monolayer or multilayer films on a variety of substrates. By using carboxylic acid end groups on the siloxane oligomers, metal ions can be incorporated into the SiOx film after UV-ozone exposure. This technique can be used to make electronically, optically, and chemically important organo-ceramic and metal oxide films on temperature sensitive substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.