Sensor apparatus for process measurement
US5661251A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 19, 1995 |
| Grant date | Aug 26, 1997 |
| Priority date | — |
| Expiry date | Dec 19, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01F23/284
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A sensor apparatus is provided for transmitting electrical pulses from a signal line into a vessel to measure a process parameter. The sensor apparatus includes a lower flange configured to be coupled to the vessel. The lower flange is formed to include a central aperture defined by a radially outwardly tapered surface located adjacent a top surface of the lower flange. The apparatus also includes a conductive probe element including a head having first and second radially outwardly tapered surfaces and an elongated conductive portion extending away from the head. The first tapered surface of the head is configured to engage the tapered surface of the lower flange to prevent movement of the probe element in a direction toward the lower flange. The apparatus further includes an upper flange configured to be coupled to the lower flange to secure the probe element to the lower flange. The upper flange includes a central aperture defined by a radially outwardly tapered surface located adjacent a bottom surface of the upper flange. The tapered surface of the upper flange is configured to engage the second tapered surface of the probe element to prevent movement of the probe element in a…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.