Excimer laser beam irradiation apparatus for optically processing workpiece
US5661744A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 8, 1995 |
| Grant date | Aug 26, 1997 |
| Priority date | — |
| Expiry date | Aug 8, 2015 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB23K26/066
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
An excimer laser beam irradiation apparatus capable of processing a workpiece optimally with an excimer irradiation beam even when intensity distribution of the excimer laser beam undergone multiple reflections is non-uniform. A patterning mask has light-transmissive portions for allowing the excimer laser beam to pass through and a reflecting layer for reflecting it. A high reflectivity mirror disposed in opposition to the reflecting layer reflects the excimer laser beam reflected from the reflecting layer toward the patterning mask. An imaging lens images a pattern of the excimer laser beam transmitted through the patterning mask onto a workpiece for irradiation thereof. A workpiece moving mechanism and a mask moving mechanism move the workpiece and the mask moving mechanism, respectively. A control unit controls the workpiece moving mechanism and the mask moving mechanism such that the patterning mask and the workpiece are displaced along a same axis synchronously with each other in a scan moving direction which coincides with a direction in which the excimer laser beam shifts positionally while being reflected between the patterning mask and the reflecting means, for thereby al…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.