Equipment for manufacturing a semiconductor device using a solid source
US5662742A · kind A · utility
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2References
5Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 27, 1996 |
| Grant date | Sep 2, 1997 |
| Priority date | — |
| Expiry date | Sep 27, 2016 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B23/06
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In an Si-MBE equipment, a vapor deposition equipment or the like, electrodes for measuring solid source resistance are disposed on both sides of the solid source, thereby being capable of monitoring the source resistance from the exterior of the equipment using those electrodes. In this situation, the resistance corresponding to the limit of the amount of its use is found in advance, thereby knowing timing of exchanging the solid source and also of previously preventing the hearth from being damaged due to unexchange of the source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.