Process for the elimination of impurities contained in a gaseous compound
US5662873A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | May 22, 1996 |
| Grant date | Sep 2, 1997 |
| Priority date | — |
| Expiry date | May 22, 2016 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF25J2215/44
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A process for the substantial elimination of at least one of the impurities carbon monoxide and hydrogen contained in a gaseous compound, according to which: PA1 (a) at least one of the impurities carbon monoxide and hydrogen contained in the gaseous compound is caused to react with oxygen, in contact with a catalyst comprising particles, on the one hand, (i) of gold, silver or gold and silver, and, on the other hand, (ii) of at least one metal of the platinum family, these particles being supported by a support to form, respectively, carbon dioxide and water; PA1 (b) as needed, the carbon dioxide and water are eliminated from the gaseous compound; PA1 (c) the gaseous compound is recovered substantially free from its impurities of carbon monoxide and/or hydrogen.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.