Process for forming diamond-like thin film
US5662877A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 30, 1992 |
| Grant date | Sep 2, 1997 |
| Priority date | — |
| Expiry date | Jan 30, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/04
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention improves the adhesive property by pretreating under uniform conditions the substrate surface of metal, ceramics or glass etc. with a poor adhesive property, by accelerating ions under an electric field to the substrate in advance of a diamond-like film forming process. In light of the fact that a diamond-like film forming process by ionized deposition uses thermal electron ionization means and an electric potential is applied to a grid to accelerate ionized hydrocarbon ions, the present invention could attain the aimed purpose by ionizing and then accelerating a bombardment gas such as argon as a pretreatment process in the same apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.