Silicon and zirconium based lacquer, its use as a substrate coating and substrates thus obtained

US5668237A · kind A · utility

Assignees

• E.I. DU PONT DE NEMOURS AND COMPANY · US
• Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE

Inventors

• Michael Popall · Coburg, DE
• Jochen Schulz · Veitshöchheim, DE
• Birke Olsowski · Veitshöchheim, DE
• Monika Pilz · Kleinrinderfeld, DE

Key dates

• Filing date: Feb 15, 1995
• Grant date: Sep 16, 1997
• Expiry date: Feb 15, 2015

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L2924/0002
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

The present invention relates to a lacquer obtained by the process comprising the steps of: (i) precondensation of: a) 1 to 10 mol % of at least one zirconium compound of the formula ZrR.sub.4 ; b) 20 to 94 mol % of at least one organic silane of the formula R".sub.m (R'"Y).sub.n SiX.sub.(4-m-n) ; c) 5 to 30 mol % of at least one organic silane of the formula R".sub.p SiX.sub.4-p ; d) optionally 0 to 10 mol % of at least one low-volatility metal oxide; and (ii) hydrolysis condensation of the precondensate of step (i) in the presence of 0 to 50% of the stoichiometric amount of water. The invention also relates to a process for the obtention of a coating on substrate which comprises the steps of applying the lacquer and curing same. The invention also relates to the thus-coated substrates.