Apparatus for plasma treatment of fine grained materials
US5670065A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 5, 1995 |
| Grant date | Sep 23, 1997 |
| Priority date | — |
| Expiry date | Jul 5, 2015 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J2219/187
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
"An apparatus for plasma treating fine-grained materials, having a receptacle that can be evacuated and that accepts and agitates the materials to be treated, and having an electromagnetic device that comprises an excitation device and electrodes and to activate a process gas filling the space of the receptacle means to form a plasma, wherein the receptacle has a conveyor which conveys the material from one end to another end and is configured for continuous admission and discharge of the material and admission and discharge of the process gas, but that is otherwise hermetically closed, and at which or in which the electromagnetic excitation device that effects the plasma formation within the conveyor is arranged."
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.