Process for forming solid state imager with microlenses
US5670384A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Sep 26, 1995 |
| Grant date | Sep 23, 1997 |
| Priority date | — |
| Expiry date | Sep 26, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F77/413
Abstract
Microlenses are formed on a solid state imager comprising a substrate having planar radiation-sensitive regions and upstanding electrode regions by forming a conformal layer of a first, low refractive index material on the substrate, and forming a planarized layer of a second, higher refractive index material on top of the layer of first material. The portions of the second material extending down between the upstanding electrode regions act as microlenses deflecting light which would otherwise fall on the radiation-insensitive electrode regions on to the radiation-sensitive regions, thus improving the quantum efficiency of the imager.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.