Patent · US Expired

Process for the manufacture of cyclosiloxanes by depolymerization of polysiloxanes

US5670689A · kind A · utility

13Cited by
3References
26Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 10, 1996
Grant dateSep 23, 1997
Priority date
Expiry dateMay 10, 2016

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08G77/045
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

The present invention relates to a process for the manufacture of cyclic polydiorganosiloxanes, especially octamethylcyclotetrasiloxane (D.sub.4) and decamethylcyclopentasiloxane (D.sub.5) by depolymerization of polydiorganosiloxanes in the presence of an initiator, characterized in that the initiator comprises either: PA0 1) at least one hydroxide chosen especially from the group made up of caesium, rubidium or quaternary phosphonium hydroxides, or: PA0 2) the association of a fluorine-free caesium or rubidium salt, or of a salt of quaternary phosphoniums, with a hydroxyl-containing strong base of an alkali or alkaline-earth metal other than Cs and Rb.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.