Method for enhancing the toughness of CVD diamond
US5672395A · kind A · utility
23Cited by
7References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 29, 1996 |
| Grant date | Sep 30, 1997 |
| Priority date | — |
| Expiry date | May 29, 2016 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/56
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for treating as as-grown chemical vapor deposited (CVD) starting diamond film having stresses and containing voids, comprises the step of subjecting the diamond film to a temperature of above about 1000.degree. C. and a hydrostatic pressure of above about 3 kilobars.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.