Multi-exposure system for hologram
US5672448A · kind A · utility
6Cited by
11References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 25, 1996 |
| Grant date | Sep 30, 1997 |
| Priority date | — |
| Expiry date | Jan 25, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03H1/28
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A hologram forming system for forming holograms on multiple exposures is provided. In this system, a holographic recording medium is exposed to light beams at least twice at incident angles different between exposures. The incident angle during each exposure process is determined in a given relation to the thickness of the holographic recording medium which tends to vary as the exposure process is repeated so that the reconstruction wavelengths match with target values without shifting between image colors during reconstruction of the hologram.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.