Patent · US Expired

Silicon membrane and method of making same

US5672449A · kind A · utility

12Cited by

3References

21Claims

0Family size

Assignees

IMS-Ionen Mikrofabrikationas Systeme · AT
Universitat Gesamthochschule Kassel · DE

Inventors

Hans Loschner · Wien, AT
Feng Shi · Beijing, CN
Ivaylo W. Rangelow · Kassel, DE

Key dates

Filing date	Aug 15, 1995
Grant date	Sep 30, 1997
Priority date	—
Expiry date	Aug 15, 2015

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/22
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A silicon membrane for use as a micromechanical sensor or as a mask for projection lithography is fabricated by doping a silicon wafer to different thicknesses at different portions and then electrochemically etching away the undoped portion of the wafer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.