Film forming apparatus
US5674368A · kind A · utility
8Cited by
15References
1Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 27, 1994 |
| Grant date | Oct 7, 1997 |
| Priority date | — |
| Expiry date | May 27, 2014 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/568
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A film forming apparatus includes a film forming chamber in which a film is formed on a substrate at a film forming position, a plurality of load lock chambers provided on the film forming chamber through gate valves respectively, a plurality of pivots provided in the film forming chamber correspondingly to the respective load lock chambers, and carrying arms supported by the pivots respectively so as to move the substrate from any one of the load lock chambers to the film forming position and contrariwise from the film forming position to any one of the load lock chambers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.