Adjustable optical test apparatus including interferometer with micromirror and alignment observation system
US5675413A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 20, 1996 |
| Grant date | Oct 7, 1997 |
| Priority date | — |
| Expiry date | Sep 20, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J9/02
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An adjustable optical system for determining aberration in a source beam by comparison of a test beam with a reference beam. The system includes a test source for producing a source beam having a spacial intensity distribution including an aberration component, a wavefront analyzer for processing a fringe signal associated with the aberration component, and an interferometer interposed between the test source and wavefront analyzer. The interferometer includes a beamsplitter for splitting the source beam into a test beam and a reference beam, a mirror disposed in the test beam path, and a micromirror disposed in the reference beam path. The micromirror reflects a central portion of the reference beam toward an imaging device and allows an outer portion of the reference beam to pass thereby. The interferometer is also provided with an alignment image assembly for collecting and detecting the outer portion of the reference beam so that the micromirror and test source may be independently adjusted relative to the central and outer portions of the reference beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.