Patent · US Expired

Photosensitive composition, photosensitive rubber plate and process for producing same, and flexographic plate and process for producing same

US5679485A · kind A · utility

26Cited by
4References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 29, 1995
Grant dateOct 21, 1997
Priority date
Expiry dateSep 29, 2015

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S430/111
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A photosensitive composition comprising: PA1 (A) 35-80 weight parts of a phosphorus-containing hydrophilic copolymer made by copolymerization of a mixture of (a) 5-30 weight % of a phosphate ester group-containing unsaturated monomer, (b) 40-90 weight % of a conjugated diene monomer, and (c) 0-50 weight % of other monoolefinically unsaturated monomer; PA1 (B) 65-20 weight parts of a thermoplastic elastomer; the sum of (A) plus (B) being 100 weight parts; PA1 (C) 5-300 weight parts of a photopolymerizable ethylenically unsaturated monomer; and PA1 (D) 0.1-10 weight parts of a photopolymerization initiator. The photosensitive composition is useful for a photosensitive rubber plate and a flexographic printing plate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.