Method and apparatus for generating induced plasma
US5680014A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 17, 1995 |
| Grant date | Oct 21, 1997 |
| Priority date | — |
| Expiry date | Mar 17, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/50
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An induced plasma generating apparatus comprises: a seed gas supply unit for supplying a seed gas, a first chamber for receiving the seed gas: a DC current source; a pair of electrodes connected to the DC current source for causing a discharge in the first chamber to generate a plasma from the seed gas; a nozzle for ejecting the plasma from the first chamber; a second chamber for receiving the plasma ejected from the first chamber; an AC current source; and a coil connected to the AC current source and disposed to surround the second chamber for producing a magnetic field in the second chamber. An induced plasma is generated by subjecting plasma in the second chamber to the magnetic field.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.