Organometallic lead precursor, in-situ synthesis thereof, lead-titanium based thin film using the same, and preparation method therefor
US5688980A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 10, 1996 |
| Grant date | Nov 18, 1997 |
| Priority date | — |
| Expiry date | Oct 10, 2016 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/409
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
An organometallic lead precursor, represented by following formula: EQU L.sub.x .multidot.Pb(THD).sub.2 I! wherein L is an electron donor ligand selected from the group consisting of NR.sub.3 (R=H, CH.sub.3) gas and Cl.sub.2 gas; THD denotes 2,2',6,6'-tetramethyl-3,5-heptanedione; and x is in the range of 0.5 to 2, is prepared by flowing a gas phase electron donor into a bubbler containing bis (2,2',6,6'-tetramethyl-3,5-heptanedione)Pb at a predetermined temperature, to synthesize, in-situ, an adduct. The precursor exhibits a remarkable improvement in volatility and in stability at the vaporization point. Lead-titanium based thin films prepared from the precursor, display superior reproducibility and reliability.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.