High absorbance/low reflectance felts with a pattern layer
US5693187A · kind A · utility
73Cited by
20References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 30, 1996 |
| Grant date | Dec 2, 1997 |
| Priority date | — |
| Expiry date | Apr 30, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24322
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
An apparatus for making paper. The apparatus comprises a felt and a pattern layer joined to the felt. The felt has a relatively high UV absorbance. Such a high UV absorbance prevents the actinic radiation applied to cure the pattern layer from scattering when the radiation penetrates the surface of the pattern layer. By limiting the scattering of radiation beneath the surface of the pattern layer, extraneous cured pattern layer material is minimized in the regions of the felt where it is desired not to have pattern layer material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.