Low temperature chemical vapor deposition method for cleaning substrate and depositing protective coating
US5693368A · kind A · utility
11Cited by
1References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 17, 1996 |
| Grant date | Dec 2, 1997 |
| Priority date | — |
| Expiry date | Sep 17, 2016 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/20
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method is disclosed to deposit aluminum coatings on high temperature superalloys for corrosion, oxidation, and erosion protection using low temperature chemical vapor deposition and an organometallic halide precursor, specifically an aluminum alkyl halide. The process is adapted to protective coatings for turbine parts having internal passages. Due to the lower temperatures used during chemical vapor deposition, a broad range of substrate materials can be utilized. The precursor vapors clean the substrate surfaces by removing native oxides while simultaneously depositing aluminum.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.