Process for developing irradiated radiation-sensitive recording materials
US5695903A · kind A · utility
10Cited by
7References
21Claims
0Family size
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Key dates
| Filing date | Dec 20, 1995 |
| Grant date | Dec 9, 1997 |
| Priority date | — |
| Expiry date | Dec 20, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/322
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for developing irradiated radiation-sensitive recording materials using an aqueous-alkaline developer which contains compounds of the formula (I) ##STR1## wherein A is H, Na, K, NH.sub.4 or NR.sub.4, where PA1 R is a substituted or unsubstituted alkyl radical, PA1 W and X, independently of one another are H or --CH.sub.2 --COOA, PA1 Y is H or COOA and PA1 Z is H or OH, wherein the compound of the formula (I) contains at least 3 COOA units.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.