Method and device for preparing implant surfaces
US5697997A · kind A · utility
32Cited by
7References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 9, 1996 |
| Grant date | Dec 16, 1997 |
| Priority date | — |
| Expiry date | May 9, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S623/901
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A method for preparing implant surfaces using gas discharge plasma including conveying the implants to a vacuum chamber. The implants are treated with an inert gas plasma to remove existing surface contamination and oxide layers from the implant surfaces. The implants are treated with an oxidizing plasma or by means of thermal oxidation to reoxidizing the implant surfaces. The implant treatment steps are carried out in a closed space, including a controlled atmosphere and produce a highly accurate and reproducible microstructure, composition, purity, and sterility in the implants.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.