Method of cleaning polymer residues with NMP
US5698045A · kind A · utility
4Cited by
13References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 16, 1996 |
| Grant date | Dec 16, 1997 |
| Priority date | — |
| Expiry date | Oct 16, 2016 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F2/008
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention is directed to a method of removing polymer residue from chemical processing equipment, comprising contacting said residue with NMP vapors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.