Process for cleaning water and organic solvent based lacquer from equipment using a single solvent mixture

US5700330A · kind A · utility

Assignee

• Herberts Gesellschaft mit beschrankter Haftung · DE

Inventors

• Wolfgang Stricker · Remscheid, DE
• Udo Hellmann · Remscheid, DE
• Werner Stephan · Wuppertal, DE

Key dates

• Filing date: Jan 11, 1996
• Grant date: Dec 23, 1997
• Expiry date: Jan 11, 2016

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C11D7/264
• WIPO field: Basic materials chemistry
• WIPO sector: Chemistry

Abstract

Process for cleaning equipment and equipment cleaner for implementing the process. The invention relates to a process for cleaning equipment contaminated with lacquer residues, in which the lacquer residues are removed with a solvent mixture and an equipment cleaner based on a solvent mixture for implementing the process. The solvent mixture contains PA1 A) 15-35 wt. % of one or more glycol ethers of the general formula I EQU OH--(CH.sub.2 --CH.sub.2 --O).sub.m --R.sub.1 I PA1 where R.sub.1 =C.sub.1-4 -alkyl and m=1 or 2 and PA1 B) 65-85 wt. % of one or more aliphatic ketones of the general formula II ##STR1## where R.sub.2=C.sub.1-3 -alkyl and R.sub.3 =C.sub.1-3 -alkyl and R.sub.2 and R.sub.3 may be identical or different.