Method for manufacturing thin film magnetic head
US5700381A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 7, 1995 |
| Grant date | Dec 23, 1997 |
| Priority date | — |
| Expiry date | Sep 7, 2015 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC04B2111/00422
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
After applying a metal film on a surface of a substrate, the metal film is patterned in such a manner that the surface of the substrate is exposed in a pattern that corresponds to the pattern of the required indented portion. Then, the substrate is immersed in an etchant which etches the substrate selectively to form the indented portion in the surface of the substrate using the metal film as a mask. The method makes it possible to define the depth and the pattern of an indented portion where a magnetic transducer is provided with a high degree of accuracy, to prevent a reduction in pattern accuracy due to re-adhering and to advance industrial productivity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.