Mask for light exposure and process for production of the same
US5700605A · kind A · utility
10Cited by
3References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 15, 1996 |
| Grant date | Dec 23, 1997 |
| Priority date | — |
| Expiry date | Mar 15, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/32
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
There is disclosed a mask for light exposure which comprises being provided with a light transparent substrate and a mask pattern formed on the light transparent substrate, the mask pattern comprising a light screening pattern composed of a material which screens the exposure light and transmits the light having the longer wavelength than that of the exposure light and a phase shift pattern formed by engraving a part of the light transparent substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.