Patent · US Expired

Device for the insolation of micrometric and/or submicrometric areas in a photosensitive layer and a method for the creation of patterns in such a layer

US5700627A · kind A · utility

7Cited by

1References

14Claims

0Family size

Assignee

COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES · FR

Inventors

Michel Ida · Saint-Égrève, FR
Robert Baptist · Échirolles, FR

Key dates

Filing date	Aug 14, 1996
Grant date	Dec 23, 1997
Priority date	—
Expiry date	Aug 14, 2016

Classification

Technology area (CPC H)Electricity
CPC primaryH01J9/025
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A device for insolating micrometric areas in a photosensitive layer and a method for producing patterns in such a layer. The method is characterized in that the layer is subjected to an atmosphere containing a transparent liquid that does not wet the photosensitive material, in order to produce on this layer a monolayer of micro-droplets (121), the layer of photosensitive material is insolated through the monolayer of micro-droplets (121) in order to selectively print the areas of exposure (122) of the layer, the micro-droplets (121) are removed, and the layer of photosensitive material is developed in order to form said patterns in accordance with the areas of exposure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.