Cleaning fluid for semiconductor substrate
US5705089A · kind A · utility
74Cited by
2References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 10, 1993 |
| Grant date | Jan 6, 1998 |
| Priority date | — |
| Expiry date | Mar 10, 2013 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D7/5022
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
An acidic or basic hydrogen peroxide cleaning fluid for cleaning a semiconductor substrate, comprising a phosphonic acid chelating agent and a wetting agent, or comprising a wetting agent alone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.