Neutral aqueous cleaning composition
US5705472A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 18, 1995 |
| Grant date | Jan 6, 1998 |
| Priority date | — |
| Expiry date | Jul 18, 2015 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/18
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
An aqueous cleaning composition having a pH of about 6 to about 8 and comprising a solution of the following ingredients: water, an organic solvent and an imidazoline-based cationic surfactant, each present in an amount effective to dissolve adherent soils from a substrate; and a nonionic surfactant in an amount sufficient to maintain said cationic surfactant in solution; and also a weak organic acid in an amount sufficient to impart to the composition said pH; wherein said composition is substantially free of any material which has an ozone-depletion factor of greater than about 0.15 and wherein said composition is substantially free of any material which would tend to form a solid with any of the ingredients comprising the composition, and its use to clean metallic and non-metallic surfaces.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.