Semiconductor light exposure apparatus
US5706076A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jan 24, 1995 |
| Grant date | Jan 6, 1998 |
| Priority date | — |
| Expiry date | Jan 24, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70583
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A semiconductor light exposure apparatus includes an excitation light source, a light beam generating device, a controller and a contracting optical system. The light beam generating device generates a fundamental wavelength laser light beam when excited by a light beam from the excitation light source, and wavelength-converts the fundamental wavelength laser light beam into a second harmonics laser light beam by a first resonator having a first non-linear optical crystal element while also converting the second harmonics laser light beam into a second harmonics laser light beam by a second resonator having a second non-linear optical crystal element. The controller controls an output of the excitation light source in order to control an output of the fourth-order harmonics laser light beam from the light beam generating device. The contracting optical system projects a pattern in a contracted size on a wafer by the fourth-order harmonics laser light beam outputted from the optical beam generating device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.