Silicon or silica substrate with a modified surface, process for producing the same, new orthoesters and process for producing the same
US5709715A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 19, 1994 |
| Grant date | Jan 20, 1998 |
| Priority date | — |
| Expiry date | May 19, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/8305
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The silicon or silica substrates described have a modified surface of a new type occupied by the alcohol fraction of an orthoester. The alcohol fraction may be saturated or unsaturated. The surface of the substrate is modified by being treated with an orthoester, the water being eliminated from the surface by hydrolysis and then replaced by the resulting alcohol or silylether. Besides many other compounds, new orthoesters having the formula R.sup.1 COCH.sub.2 --CH.sub.2 --O--CO--CH.dbd.CH.sub.2 !.sub.3, in which R.sup.1 stands for hydrogen or for a clearable organic residue, R stands for (CH.sub.2).sub.n, in which n stands for an integer between 1 and 18, and new orthoesters having the formula (I), are particularly appropriate. In the formula (I), R.sup.1 stands for hydrogen or an organic residue, R.sup.3 stands for hydrogen or an alkyl group with 1 to 6 carbon atoms; and R.sup.4 stands for hydrogen, an alkyl group or an alkyl group or a phenyl group. The modified surfaces have a larger wetting or contact angle, and thus a reduced wettability. In addition, they are capable of reacting with other monomers or polymers by means of all sorts of reactive substituents. This kind of surfa…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.