Method for controlling the ion generation rate for mass selective loading of ions in ion traps
US5710427A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 19, 1996 |
| Grant date | Jan 20, 1998 |
| Priority date | — |
| Expiry date | Jan 19, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J49/4285
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of mass selective loading of ion traps by ejection of undesirable ion species during the loading process by applying RF voltages with a mixture of frequency components to the trap electrodes. For several mass spectrometric investigations only ions with desired mass-to-charge ratios are to be loaded into the ion trap in order to achieve a more efficient utilization of the limited storage capability of the ion trap. The generation rate of the ions during the loading process in such a way that the equilibrium of the space charge inside the ion trap, balanced between ion generation rate and ion ejection rate, does not significantly deteriorate the mass resolution of the ejection process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.