Interferometric measuring device forming a spacial interference pattern
US5710629A · kind A · utility
2Cited by
3References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 5, 1995 |
| Grant date | Jan 20, 1998 |
| Priority date | — |
| Expiry date | May 5, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2006/12195
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Two input beams (10, 20) of the interferometric measuring device, achieved according to the integrated optics technology, are broadened so as to form two spread flat beams creating an interference pattern (30). Two detectors (14, 15) supply two measuring signals, preferably in phase quadrature, representative of two points of the interference plane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.