Apparatus for variable optical focusing for processing chambers
US5711810A · kind A · utility
3Cited by
7References
10Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 4, 1996 |
| Grant date | Jan 27, 1998 |
| Priority date | — |
| Expiry date | Dec 4, 2016 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/28
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In a pulsed laser deposition system, the two optical actions of focusing rastering, and the optical chamber window are combined into a single optics system. The single optics system is mounted on the processing chamber. Combining the three separate optical functions into one optics system facilitates laser beam control and reduces the space needed for the apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.