Method for making dichroic filter array
US5711889A · kind A · utility
Inventor
Key dates
| Filing date | Sep 15, 1995 |
| Grant date | Jan 27, 1998 |
| Priority date | — |
| Expiry date | Sep 15, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0007
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A dichroic filter array is mounted on a wafer by combining microelectronic and microlithography techniques. A release layer of copper is evaporated onto a wafer, and the release layer is coated with a photoresist. The assembly is masked, and the unmasked photoresist, after exposure to ultraviolet light, is developed to expose a predetermined section of the release layer. That section of release layer is then overetched to create an undercut in its walls and to expose the underlying wafer. Dichroic filter material is then deposited onto the wafer by a cold process, and the release layer is then removed, leaving only the dichroic filter material on the wafer. The process is repeated to create an array.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.