Computer-aided method for producing resistive tapers and resistive taper produced thereby
US5712613A · kind A · utility
3Cited by
24References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 5, 1995 |
| Grant date | Jan 27, 1998 |
| Priority date | — |
| Expiry date | May 5, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49099
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for producing a desired resistive taper under computer control for controlling the surface resistivity of an electrical element, which comprises the steps of creating a computer controlled optically graded pattern corresponding to the desired resistive taper, producing a phototool from the graded pattern and using the phototool to photochemically etch the graded pattern onto a substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.