Method and apparatus for tuning field for plasma processing using corrected electrode
US5716486A · kind A · utility
19Cited by
20References
30Claims
0Family size
Inventors
Key dates
| Filing date | Apr 19, 1996 |
| Grant date | Feb 10, 1998 |
| Priority date | — |
| Expiry date | Apr 19, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6831
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A device for reducing plasma irregularities includes an electrode assembly capable of applying an electric potential to said plasma. The electrode assembly includes a portion for reducing the plasma irregularities. The portion which reduces the plasma irregularities includes alternately a buried portion which is capable of altering the potential within the buried element, or else a conditioned portion of the surface which controls reflectivity and/or emissivity of portions of a surface of the electrode assembly differently.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.