Positive-working quinone diazide resist composition containing organic phosphoric compound and an amine and process for the formation of fine pattern using same
US5716753A · kind A · utility
7Cited by
1References
3Claims
0Family size
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Key dates
| Filing date | Jul 3, 1996 |
| Grant date | Feb 10, 1998 |
| Priority date | — |
| Expiry date | Jul 3, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/085
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive-working photosensitive composition comprises: PA1 (1) an alkali-soluble resin; PA1 (2) a quinonediazide compound; PA1 (3) an organic phosphoric compound; and PA1 (4) at least one of a phenylenediamine compound and a derivative thereof, 2-amino-1-phenylethanol, N-phenyldiethanolamine, N-phenylethanolamine, N-ethyldiethanolamine, and N-ethylethanolamine. The resist composition exhibits so higher an adhesion to a substrate than ever as to provide an enhanced accuracy in processing during etching, enabling subsequent faithful transfer of a finer pattern to the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.