Patent · US Expired

Apparatus for coating a substrate from an electrically conductive target

US5718815A · kind A · utility

15Cited by

3References

6Claims

0Family size

Assignee

Balzers und Leybold Duetschland Holding AG · DE

Inventors

Joachim Szczyrbowski · Goldbach, DE
Gotz Teschner · Hanau, DE
Gunter Brauer · Lehre, DE

Key dates

Filing date	Sep 12, 1996
Grant date	Feb 17, 1998
Priority date	—
Expiry date	Sep 12, 2016

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/0206
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A vacuum chamber includes a central compartment (1) in which a diode cathode (6) carrying an electrically conductive sputtering target (7) is located, and two outer compartments (11, 12) in which magnetron cathodes (13, 14) carrying target 15, 16) are located, the magnetron cathodes (13, 14) being connected to respective poles (20, 21) of an AC power source. The outer compartments (11, 12) are separated from the central compartment by walls having openings (33, 34) which flank a space (28) between the sputtering target (6) and the substrate (3). Process gas lines 24, 25) are arranged to introduce process gas into this space (3).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.