Substrate having light shielding layer
US5718992A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 6, 1996 |
| Grant date | Feb 17, 1998 |
| Priority date | — |
| Expiry date | Nov 6, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0007
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for preparing a substrate having a light-shielding layer involves forming a photosensitive coating film on a transparent electrically conductive layer formed on a transparent substrate, exposing the photosensitive coating film via a mask exhibiting light transmitting properties, removing and developing the coating film for exposing the transparent electrically conductive layer and electrodepositing a dark-hued coating on the exposed transparent electrically conductive layer for forming the light-shielding layer, and heating the light-shielding layer. The substrate having the light-shielding layer has a volume resistivity of 1.times.10.sup.2 ohm.cm or higher and may be used for a counterelectrode substrate for a TFT array substrate incorporated in a liquid crystal display device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.