Method for increasing the differential solubility of an imaged photoresist through hydroxy group blocking via reaction with vinyl ethers
US5719003A · kind A · utility
0Cited by
3References
6Claims
0Family size
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Key dates
| Filing date | Sep 27, 1995 |
| Grant date | Feb 17, 1998 |
| Priority date | — |
| Expiry date | Sep 27, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/022
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist composition comprising an alkali soluble resin and an ortho-naphthoquinone diazide sulfonic acid ester of a polyhydroxy alcohol. The photoresist is characterized by having at least a portion of its free hydroxyl groups on the photoactive compound blocked with an acid labile blocking group that generates a hydroxide upon cleavage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.