Semiconductor laser
US5721751A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 6, 1997 |
| Grant date | Feb 24, 1998 |
| Priority date | — |
| Expiry date | Feb 6, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/3434
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A semiconductor laser includes (a) a semiconductor substrate of a first conductivity type on which is provided (b) a mesa stripe portion having a multilayer structure. The multilayer structure includes (b-1) an active layer provided on the semiconductor substrate. The laser also includes (c) a buried current blocking layer arranged on both sides of the mesa stripe portion, (d) a clad layer of a second conductivity type provided on the semiconductor substrate through at least a portion of the active layer, and (e) a contact layer of the second conductivity type provided on the clad layer. The contact layer includes a first contact layer contacting the clad layer and a second contact layer provided on the first contact layer. The first contact layer has an energy gap smaller than that of the clad layer and larger than that of the second contact layer. Preferably, the first contact layer is an InGaAsP semiconductor layer having an energy gap within the range of from 0.82 eV to 1.12 eV, the second contact layer is selected from the group consisting of an InGaAs semiconductor layer and an InGaAsP semiconductor layer which has an energy gap of 0.8 eV, and the clad layer contacting the fi…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.