Photographic elements having a process-surviving polysiloxane block copolymer backing
US5723270A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 19, 1996 |
| Grant date | Mar 3, 1998 |
| Priority date | — |
| Expiry date | Nov 19, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/162
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photographic element is disclosed which comprises (a) a support, (b) a radiation-sensitive silver halide emulsion layer on one side of the support, and (c) a protective backing on the opposite side of the support which provides scratch and abrasion resistance and process surviving lubricity. The protective backing is comprised of one or more layers, the outermost of which comprises a film-forming hydrophobic lubricious polyimide-siloxane block copolymer. In preferred embodiments of the invention, the backing further comprises a solid particle dye dispersion of a filter dye which is readily soluble or decolorizable in alkali aqueous photographic processing solutions at pH of 8 or above dispersed in an alkaline aqueous insoluble, organic solvent soluble film forming binder, and an electrically conductive agent, such that the backing provides halation protection during exposure as well as process-surviving antistatic protection. The present invention provides photographic elements with a backing which provides photographic process-surviving lubricity. In preferred embodiments, the backing includes a filter dye layer which provides effective antihalation protection, where the filter …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.